Nanoscience and Nanotechnology Faculty
NanoTECH Research Area Affiliations
Research Summary
New approaches to nanoscale patterning and film growth using low-energy electron beam enhanced deposition are being developed. The new techniques currently focus on growth of semiconductor surfaces such as SiC and are part of a larger scale effort to produce devices based upon nanographitic systems. The diffraction and inelastic scattering of low-energy electrons are exploited to produce nanopatterns on surfaces. This technique, developed by the Orlando group, is called diffraction in electron-stimulated desorption (DESD). Efforts are also underway to advance the theoretical description of DESD and experimentally develop DESD as a novel method for obtaining holographic 3-D images of nanostructures with atomic scale resolution.



